Hsinchu, Taiwan

Kai-Lin Chan

This inventor holds 2 USPTO granted patents. Top assignee: Altek Corporation. Active years: 2020-2021.


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Kai-Lin Chan

Introduction

Kai-Lin Chan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of image processing, holding a total of 2 patents. His work focuses on optimizing image quality through advanced techniques that leverage depth information.

Latest Patents

Kai-Lin Chan's latest patents include an image processing method and an electronic device capable of optimizing HDR images by using depth information. This innovative method involves obtaining multiple first images and first depth information to generate a second image. The process identifies subjects and backgrounds, determining whether optimization is necessary. If required, the subject is optimized, and an output image is generated accordingly. Another patent involves an image processing method and device that captures a first image of a specific scene, determines brightness, and synthesizes high dynamic range images by optimizing subjects based on brightness thresholds.

Career Highlights

Kai-Lin Chan is currently employed at Altek Corporation, where he continues to develop cutting-edge technologies in image processing. His work has contributed to advancements in electronic devices that enhance image quality for various applications.

Collaborations

Kai-Lin Chan collaborates with Hsu-Lien Huang, working together to push the boundaries of image processing technology.

Conclusion

Kai-Lin Chan's innovative contributions to image processing demonstrate his expertise and commitment to advancing technology in this field. His patents reflect a deep understanding of the complexities involved in optimizing image quality, making him a valuable asset in the industry.

Profile summary based on public USPTO records.
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