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Title: The Innovative Contributions of Kai Kaufmann
Introduction
Kai Kaufmann is a notable inventor based in Halle, Germany. He has made significant contributions to the field of microparticle filtration and characterization. His innovative work has led to the development of a unique filter substrate that enhances the quality of optical measurements.
Latest Patents
Kaufmann holds a patent for a "Filter substrate for filtering and optically characterizing microparticles, method for producing the filter substrate, and use of the filter substrate." This invention relates to a filter substrate designed for filtering and optically characterizing microparticles. The filter substrate consists of a wafer with a thickness of at least 100 micrometers and a transmittance of at least 10% for radiation in the wavelength range of 2500 nm to 15000 nm. The wafer's surfaces may be treated with an antireflective layer to minimize optical reflection in the wavelength range of 200 nm to 10000 nm. Additionally, the wafer features filter holes with diameters ranging from 1 micrometer to 5 millimeters. This innovative filter substrate allows for high-quality optical characterization of microparticles after filtration.
Career Highlights
Throughout his career, Kaufmann has worked with esteemed organizations such as the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. and Hochschule Anhalt. His experience in these institutions has contributed to his expertise in the field of microparticle research and filtration technologies.
Collaborations
Kaufmann has collaborated with notable colleagues, including Christian Hagendorf and Ulrike Braun. Their joint efforts have further advanced the research and development of innovative filtration solutions.
Conclusion
Kai Kaufmann's contributions to the field of microparticle filtration and characterization demonstrate his commitment to innovation. His patented filter substrate represents a significant advancement in the ability to filter and optically analyze microparticles with high precision.