The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Apr. 11, 2019
Applicants:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E. V., Munich, DE;

Hochschule Anhalt (Fh), Köthen, DE;

Bundesanstalt Für Materialforschung Und-prüfung (Bam), Berlin, DE;

Inventors:

Christian Hagendorf, Halle, DE;

Kai Kaufmann, Halle, DE;

Ulrike Braun, Berlin, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/06 (2006.01); B23K 26/382 (2014.01); G01N 1/40 (2006.01);
U.S. Cl.
CPC ...
G01N 15/0612 (2013.01); B23K 26/382 (2015.10); G01N 1/4077 (2013.01); G01N 2001/4088 (2013.01);
Abstract

The present invention relates to a filter substrate for filtering and optically characterizing microparticles. The filter substrate comprises a wafer having a thickness of at least 100 pm and a transmittance of at least 10% for radiation in the wavelength range of 2500 nm to 15000 nm. Furthermore, the surface of the front side and/or the surface of the rear side of the wafer is completely or partially provided with an antireflective layer, which prevents the optical reflection of radiation in the wavelength range of 200 nm to 10000 nm. Moreover, the wafer has, at least in some regions, filter holes having a diameter of 1 pm to 5 mm. With the filter substrate according to the invention, microparticles can be filtered and the microparticles on the filter substrate can be subsequently optically characterized with very high measurement quality. The present invention further relates to a method for producing the filter substrate according to the invention and to the use of the filter substrate according to the invention.


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