Tokyo, Japan

Kai Futamata

This inventor holds 4 USPTO granted patents and 7 published patent applications. Top assignee: Toppan Inc.. Active years: 2026.

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.5

ph-index = 1


Company Filing History:


Years Active: 2026

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Kai Futamata

Introduction

Kai Futamata is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical technology, holding a total of 4 patents. His work focuses on developing advanced materials and devices that enhance visual displays.

Latest Patents

Futamata's latest patents include innovations such as an optical film, a display device, and a composition for forming a colored layer. The composition for forming a colored layer consists of a dye, an ionizing radiation-curable resin, a photoinitiator, and a solvent. The dye features a first colorant with a maximum absorption wavelength in the range of 470 nm to 530 nm, and a second colorant with a maximum absorption wavelength in the range of 560 nm to 620 nm. This innovative approach allows for improved color accuracy and display quality in various applications.

Career Highlights

Kai Futamata is currently employed at Toppan Inc., where he continues to push the boundaries of optical technology. His work has been instrumental in developing products that meet the growing demands of the display industry. His expertise and innovative mindset have positioned him as a key player in his field.

Collaborations

Futamata collaborates with talented individuals such as Yoshiko Ishimaru and Takenori Goda. Together, they work on projects that aim to advance optical technologies and improve product performance.

Conclusion

Kai Futamata's contributions to the field of optical technology are noteworthy and impactful. His innovative patents and collaborations reflect his commitment to advancing the industry. His work continues to influence the development of high-quality display technologies.

Profile summary based on public USPTO records.
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