Kadthala Ramaya Narendmath

Title: Innovations of Kadthala Ramaya Narendmath

Introduction

Kadthala Ramaya Narendmath is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of chemical mechanical polishing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of polishing pads used in various applications.

Latest Patents

Kadthala holds a patent for a "Printing chemical mechanical polishing pad having window or controlled porosity." This invention involves a method of fabricating a polishing pad by determining a desired distribution of voids within a polymer matrix. The process includes generating electronic control signals for a 3D printer, specifying where the polymer matrix precursor should be deposited and where voids should be created. The result is a solidified polymer matrix with a controlled distribution of voids, enhancing the performance of the polishing pad.

Career Highlights

Kadthala is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies. His expertise in the field has positioned him as a valuable asset to his team and the company.

Collaborations

Kadthala collaborates with Laxman Murugesh, who is also a key contributor to their projects. Together, they work on advancing technologies that improve manufacturing processes.

Conclusion

Kadthala Ramaya Narendmath's contributions to the field of chemical mechanical polishing demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in the development of more efficient polishing pads.