Newfield, NJ, United States of America

Kadthala R Narendrnath

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Polar Materials, Inc.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kadthala R Narendrnath. Retrieved from https://idiyas.com/inventor/kadthala-r-narendrnath

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Kadthala R Narendrnath: Innovator in Plasma Cleaning Technology

Introduction

Kadthala R Narendrnath is a notable inventor based in Newfield, NJ (US). She has made significant contributions to the field of cleaning technologies, particularly through her innovative methods involving plasma. Her work has garnered attention for its potential applications in various industries.

Latest Patents

Kadthala holds a patent for a method titled "Method for cleaning hollow articles with plasma." This innovative approach involves introducing an oxidizing working gas into the interior of a hollow article while maintaining a sub-atmospheric pressure. An electric field is then applied to convert the oxidizing gas into a low-temperature plasma, effectively oxidizing substances within the hollow article. This method presents a novel solution for cleaning complex geometries that are often challenging to address with traditional cleaning methods.

Career Highlights

Kadthala R Narendrnath is currently associated with Polar Materials, Inc., where she continues to develop and refine her innovative cleaning technologies. Her expertise in plasma technology has positioned her as a key player in advancing methods that enhance the efficiency and effectiveness of cleaning processes.

Collaborations

Kadthala has worked alongside talented colleagues, including Robert J Babacz and Kevin Frake. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies in the field.

Conclusion

Kadthala R Narendrnath's contributions to plasma cleaning technology exemplify her commitment to innovation and excellence. Her patented method showcases the potential for advancements in cleaning processes, making her a significant figure in her field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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