This inventor holds 2 USPTO granted patents. Top assignees: The Hong Kong Polytechnic University, Australian Wool Innovation Limited, Australian Wool Inovation Limited. Active years: 2014-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hong Kong, CN (2014)
- Hong Kong, CH (2016)
Company Filing History:
2 out of 441 
1 out of 3 
1 out of 1 Years Active: 2014-2016
Title: Ka Leung Kevin Cheuk: Innovator in Self-Cleaning Wool Technology
Introduction
Ka Leung Kevin Cheuk is a notable inventor based in Hong Kong, CH. He has made significant contributions to the field of textile innovation, particularly in the development of self-cleaning wool. With a total of 2 patents, his work showcases the intersection of technology and sustainability in textile applications.
Latest Patents
One of his latest patents is focused on a formulation for coated self-cleaning wool. This invention relates to methods of making articles and systems for providing wool articles with self-cleaning properties. The self-cleaning properties are achieved by coating the wool articles with a photocatalyst formulation. This formulation contains titanium compounds, stabilizers, catalysts, and water, which work together to enhance the wool's functionality.
Career Highlights
Throughout his career, Ka Leung Kevin Cheuk has worked with esteemed organizations such as The Hong Kong Polytechnic University and Australian Wool Innovation Limited. His experience in these institutions has allowed him to advance his research and development in textile technology.
Collaborations
He has collaborated with notable coworkers, including Yee Yee Kong and Xiaowen Wang, contributing to various projects that aim to innovate and improve textile properties.
Conclusion
Ka Leung Kevin Cheuk's work in self-cleaning wool technology exemplifies the potential for innovation in sustainable textiles. His patents and collaborations reflect a commitment to advancing the field and addressing modern challenges in textile applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile