Midland, MI, United States of America

K Van Phung


Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1989-1990

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2 patents (USPTO):Explore Patents

Title: K Van Phung: Innovator in Polymer Chemistry

Introduction

K Van Phung is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of polymer chemistry, particularly in the development of innovative compositions that enhance various industrial processes. With a total of 2 patents, his work has had a substantial impact on the industry.

Latest Patents

K Van Phung's latest patents include a hydrophobe associative composition containing a polymer of an ethylenically unsaturated, water-soluble monomer such as acrylamide and an ethylenically unsaturated amphiphilic monomer like dodecyl poly(oxyethylene).sub.10 methacrylate. This composition is particularly effective for increasing the viscosity of brines or other aqueous media containing salts or other electrolytes. Such copolymers are therefore useful in mobility control fluids and fracturing fluids for enhanced oil recovery, as well as drag reduction agents. Another significant patent is the preparation of N-vinyl-2-oxazolidinone, which involves a process for the preparation of N-vinyl-2-oxazolidinones through pyrolysis of N-(1-hydroxyalkyl)-2-oxazolidinone or N-(1-hydrocarbyloxyalkyl)-2-oxazolidinone under specific conditions.

Career Highlights

K Van Phung is currently associated with The Dow Chemical Company, where he continues to innovate and develop new chemical processes and products. His expertise in polymer chemistry has positioned him as a valuable asset to the company and the industry at large.

Collaborations

K Van Phung has collaborated with Syamalarao Evani, working together on various projects that leverage their combined expertise in polymer science.

Conclusion

K Van Phung's contributions to polymer chemistry and his innovative patents demonstrate his commitment to advancing the field. His work continues to influence industrial applications and enhance processes in various sectors.

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