This inventor holds 3 USPTO granted patents. Top assignee: Betz Laboratories, Inc.. Active years: 1977-1978.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1977-1978
Title: K Robert Lange: Innovator in Microbiological Deposit Removal
Introduction
K Robert Lange is a notable inventor based in Huntingdon Valley, PA (US). He has made significant contributions to the field of microbiological deposit removal, holding a total of 3 patents. His work focuses on developing methods and agents that effectively detach and disperse microbiological deposits in aqueous systems.
Latest Patents
One of Lange's latest patents addresses the removal of microbiological deposits. The present disclosure outlines methods and agents for detaching and dispersing these deposits, which occur on support materials in contact with aqueous systems. The method involves adding an agent with hydrogen-bonding characteristics to the aqueous medium, allowing it to contact the deposits. Preferred agents include urea, ethanolamine, water-soluble acrylamide polymers, and water-soluble reaction products of amines, as well as epoxy or epoxy precursor compounds and their mixtures.
Career Highlights
K Robert Lange is associated with Betz Laboratories, Inc., where he has been instrumental in advancing technologies related to microbiological deposit removal. His innovative approaches have contributed to the efficiency and effectiveness of cleaning processes in various industries.
Collaborations
Lange has collaborated with Donald F Jacques, further enhancing the research and development efforts in their field. Their combined expertise has led to advancements in the methods for managing microbiological deposits.
Conclusion
K Robert Lange's work in microbiological deposit removal showcases his innovative spirit and dedication to improving industrial processes. His contributions continue to impact the field positively, demonstrating the importance of research and development in addressing complex challenges.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile