Company Filing History:
Years Active: 2006
Title: K Leo Zhang: Innovator in Metal Structures for Integrated Circuits
Introduction
K Leo Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of integrated circuits, particularly in the development of metal structures that enhance the manufacturing process. His innovative approach addresses common challenges faced during the production of integrated circuits.
Latest Patents
K Leo Zhang holds a patent for "Metal structures for integrated circuits and methods for making the same." This patent describes metal structures that range from small to large features, which are designed to be resistant to peeling problems that can occur during heat treatments in the manufacturing process. The invention includes a capping layer over the dielectric layer, which enhances the adhesion of the metal structure to the underlying substrate, thereby reducing or preventing peeling issues.
Career Highlights
K Leo Zhang is associated with Matrix Semiconductor, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the reliability and efficiency of integrated circuit manufacturing.
Collaborations
Some of his notable coworkers include Michael A Vyvoda and Steven J Radigan, who have collaborated with him on various projects within the semiconductor industry.
Conclusion
K Leo Zhang's contributions to the field of integrated circuits through his innovative patent demonstrate his commitment to improving manufacturing processes. His work continues to influence the semiconductor industry positively.