Jürgen Hofmann

Title: Jürgen Hofmann: Innovator in Lithography Technology

Introduction

Jürgen Hofmann is a notable inventor based in Ellwangen, Germany. He has made significant contributions to the field of lithography, particularly through his innovative designs and methods. His work has been recognized in the industry, showcasing his expertise and dedication to advancing technology.

Latest Patents

Hofmann holds a patent for a lithography apparatus and method. This invention involves a lithography machine that includes an optical element, an interface coupled to the optical element, and a component that is separate from the interface. The interface is directly connected to the optical element, which features an engaging section. The component has a counter engaging section designed to engage with the engaging section of the optical element, allowing for a form-fitting and/or force-fitting connection.

Career Highlights

Jürgen Hofmann is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His role at the company has allowed him to work on cutting-edge projects that push the boundaries of what is possible in lithography.

Collaborations

Throughout his career, Hofmann has collaborated with talented individuals such as Björn Liebaug and Franz-Josef Stickel. These collaborations have contributed to the development of innovative solutions in the lithography sector.

Conclusion

Jürgen Hofmann's contributions to lithography technology through his patent and work at Carl Zeiss SMT GmbH highlight his role as an influential inventor in the field. His innovative spirit continues to drive advancements in optical systems.