Pyrbaum, Germany

Jürgen Elger

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignees: Infineon Technologies Ag, Siemens Aktiengesellschaft. Active years: 2005-2018.


% Patents Active = 100.0

 

Average Co-Inventor Count = 1.7

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2005-2018

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2 patents (USPTO):Explore Patents

Title: Jürgen Elger: Innovator in Process Monitoring and Wafer Processing

Introduction

Jürgen Elger is a notable inventor based in Pyrbaum, Germany. He has made significant contributions to the fields of process monitoring and wafer processing, holding a total of 2 patents. His innovative methods and installations have advanced the efficiency and effectiveness of production plants.

Latest Patents

Elger's latest patents include a method for monitoring a process and/or production plant. This method involves providing first result data from one engineering system and second result data from another, allowing for a comprehensive analysis of the components involved. Additionally, he has developed an installation for processing wafers, which features multiple fabrication and measurement units, along with a transport system designed to optimize wafer transport procedures based on capacity utilization.

Career Highlights

Throughout his career, Jürgen Elger has worked with prominent companies such as Infineon Technologies AG and Siemens Aktiengesellschaft. His experience in these organizations has equipped him with the knowledge and skills necessary to innovate in his field.

Collaborations

Elger has collaborated with notable colleagues, including Michael Dallmann and Christiane Gast. These partnerships have contributed to the development of his patents and the advancement of technology in his areas of expertise.

Conclusion

Jürgen Elger's contributions to process monitoring and wafer processing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of engineering systems and production efficiency.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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