Nattheim, Germany

Jürgen Abraham

This inventor holds 1 USPTO granted patent and 4 published patent applications and 3 EPO patents. Top assignee: Voith Patent Gmbh. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jürgen Abraham. Retrieved from https://idiyas.com/inventor/jürgen-abraham

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jürgen Abraham: Innovator in Paper Machine Technology

Introduction

Jürgen Abraham is a notable inventor based in Nattheim, Germany. He has made significant contributions to the field of paper machine technology, particularly through his innovative patent.

Latest Patents

Abraham holds a patent for a monofilament yarn designed for paper machine clothing fabric. This patent, titled "Monofilament yarn for a paper machine clothing fabric," includes a unique composition that incorporates an additive for detecting defects in the fabric. This innovation enhances the quality control processes in paper manufacturing.

Career Highlights

Jürgen Abraham is associated with Voith Patent GmbH, a company known for its advancements in technology and engineering solutions. His work at Voith has allowed him to focus on developing innovative solutions that improve the efficiency and effectiveness of paper production.

Collaborations

Throughout his career, Abraham has collaborated with talented professionals, including Ashish Sen and Brian Good. These collaborations have contributed to the development of cutting-edge technologies in the industry.

Conclusion

Jürgen Abraham's contributions to paper machine technology through his patent demonstrate his commitment to innovation and quality in manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…