Zurich, Switzerland

Jürg Hans Fröhlich

This inventor holds 2 USPTO granted patents and 1 published patent application and 5 EPO patents. Top assignees: ETH Zurich, National University of Singapore, Nemodevices Ag. Active years: 2017-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jürg Hans Fröhlich. Retrieved from https://idiyas.com/inventor/jürg-hans-fröhlich

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Zürich, CH (2017)
  • Zurich, CH (2021)

Company Filing History:


Years Active: 2017-2021

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2 patents (USPTO):Explore Patents

Title: Jürg Hans Fröhlich: Innovator in Medical Technology

Introduction

Jürg Hans Fröhlich is a notable inventor based in Zürich, Switzerland. He is currently associated with Luciole Medical AG, a company focused on advancing medical technology. Despite having no patents to his name, his contributions to the field are significant.

Latest Patents

As of now, Jürg Hans Fröhlich holds 2 patents. This indicates that his work may be more focused on collaborative projects or research rather than individual patent filings.

Career Highlights

Throughout his career, Jürg has been involved in various innovative projects within the medical technology sector. His expertise and dedication have made him a valuable asset to Luciole Medical AG.

Collaborations

Jürg collaborates closely with his coworker, Marco Zahner. Together, they work on developing cutting-edge solutions that aim to improve patient care and medical outcomes.

Conclusion

Jürg Hans Fröhlich is an influential figure in the medical technology landscape, contributing to advancements through his work at Luciole Medical AG. His collaborative efforts and commitment to innovation highlight the importance of teamwork in driving progress in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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