This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2007.
Company Filing History:
Years Active: 2007
Title: Jörn Regul - Innovator in Microelectronics
Introduction
Jörn Regul is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of microelectronics and micromechanics. His innovative work has led to the development of a unique patent that enhances fabrication methods in this domain.
Latest Patents
Jörn Regul holds a patent for a "Method for fabricating a shadow mask in a trench of a microelectronic or micromechanical structure." This invention outlines a comprehensive process that includes several steps: providing a trench in the microelectronic or micromechanical structure, partial filling of the trench, and the application of a first liner mask layer. The method further involves creating a sacrificial filling to completely fill the trench, shallow etching back of the sacrificial filling, and forming a first mask on the top side of the sacrificial filling. The process culminates in the removal of specific subregions to create a second mask, enhancing the precision of microelectronic structures.
Career Highlights
Jörn Regul is currently associated with Infineon Technologies AG, a leading company in the semiconductor industry. His role at Infineon allows him to apply his innovative ideas and contribute to cutting-edge technology in microelectronics.
Collaborations
He collaborates with Dietmar Temmler, a fellow innovator, to further advance their research and development efforts in the field.
Conclusion
Jörn Regul's contributions to microelectronics through his patent and work at Infineon Technologies AG highlight his role as a key innovator in the industry. His methods for fabricating shadow masks represent a significant advancement in the field.