Gelnhausen, Germany

Jörg Sauer

This inventor holds 1 USPTO granted patent. Top assignee: Degussa Aktiengesellschaft. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jörg Sauer. Retrieved from https://idiyas.com/inventor/jörg-sauer-kjqj1py5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Jörg Sauer: Innovator in Catalysis

Introduction

Jörg Sauer is a notable inventor based in Gelnhausen, Germany. He has made significant contributions to the field of catalysis, particularly through his innovative work on Raney copper.

Latest Patents

Jörg Sauer holds a patent for Raney copper, which is doped with at least one metal from the group comprising iron and/or noble metals. This invention is utilized as a catalyst in the dehydrogenation of alcohols, showcasing its importance in chemical processes.

Career Highlights

Sauer is associated with Degussa Aktiengesellschaft, a prominent company in the chemical industry. His work has been instrumental in advancing catalytic technologies, which are crucial for various industrial applications.

Collaborations

Throughout his career, Jörg has collaborated with notable colleagues, including Daniel Ostgard and Andreas Freund. These partnerships have further enriched his research and development efforts.

Conclusion

Jörg Sauer's contributions to catalysis, particularly through his patent on Raney copper, highlight his role as an influential inventor in the field. His work continues to impact the chemical industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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