Zurich, Switzerland

Jörg Haberecht

This inventor holds 1 USPTO granted patent. Top assignee: ETH Zurich. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jörg Haberecht. Retrieved from https://idiyas.com/inventor/jörg-haberecht

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Jörg Haberecht: Innovator in High-Temperature Ceramics

Introduction

Jörg Haberecht is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of ceramics, particularly in the production of high-temperature materials. His innovative work has led to advancements that are essential for various industrial applications.

Latest Patents

Jörg Haberecht holds a patent for a method of producing a B/N/C/Si ceramic from a borazine precursor. The patent details a process where B-tris(silylvinyl)borazine is pyrolyzed to create a high-purity ceramic that is essentially free of pores. This ceramic is particularly advantageous as a coating material and for the production of heating elements due to its high-temperature stability and low oxygen content.

Career Highlights

Haberecht is affiliated with the Eidgenössische Technische Hochschule Zurich, a prestigious institution known for its research and innovation in technology and engineering. His work has been instrumental in advancing the understanding and application of ceramic materials in high-temperature environments.

Collaborations

Throughout his career, Jörg has collaborated with esteemed colleagues such as Reinhard Nesper and Hansjörg Grützmacher. These collaborations have further enriched his research and contributed to the development of innovative ceramic technologies.

Conclusion

Jörg Haberecht's contributions to the field of ceramics exemplify the importance of innovation in material science. His patented methods and ongoing research continue to pave the way for advancements in high-temperature applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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