Lausanne, Switzerland

Jérôme Genton

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Synova Sa. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jérôme Genton. Retrieved from https://idiyas.com/inventor/jérôme-genton

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jérôme Genton: Innovator in CVD Diamond Processing

Introduction

Jérôme Genton is a notable inventor based in Lausanne, Switzerland. He has made significant contributions to the field of Chemical Vapor Deposition (CVD) diamonds, particularly in their processing after fabrication. His innovative approach has led to advancements in the way CVD diamonds are cored and sliced.

Latest Patents

Jérôme Genton holds a patent for a "Method for coring and slicing a CVD diamond product and apparatus for carrying it out." This patent focuses on a method that involves cutting a CVD diamond product, which includes a CVD diamond and graphitized material covering several side-faces of the diamond. The method utilizes a laser beam coupled into a fluid jet to effectively remove the graphitized material and slice the diamond.

Career Highlights

Throughout his career, Jérôme has worked with Synova SA, a company known for its expertise in laser technology and diamond processing. His work has been instrumental in enhancing the efficiency and precision of diamond cutting techniques.

Collaborations

Jérôme has collaborated with talented individuals such as Bernold Richerzhagen and Jérémie Diboine, contributing to the advancement of technologies in the diamond processing industry.

Conclusion

Jérôme Genton's innovative methods in CVD diamond processing exemplify the impact of creativity and technology in the field of materials science. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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