Jyunji Kido

Title: Jyunji Kido: Innovator in Sputtering Technology

Introduction

Jyunji Kido is a notable inventor based in Yonezawa, Japan. He has made significant contributions to the field of sputtering technology, particularly in the development of materials that enhance the performance of thin films.

Latest Patents

Kido holds a patent for a sputtering target, which is crucial for producing high-quality thin films. The patent, titled "Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film," describes a sputtering target that provides high water barrier properties and flexibility. This innovation ensures a high film-forming rate during sputtering while minimizing damage to the substrate. The target is made from a mixed powder containing 20 to 80% by weight of SiO powder, with the remainder being TiO powder and/or Ti powder. The resulting sintered body has a specific composition of SiαTiβOγ, where α, β, and γ represent the mole ratios of silicon, titanium, and oxygen, respectively.

Career Highlights

Throughout his career, Jyunji Kido has worked with prominent companies such as Osaka Titanium Technologies Co., Ltd. and Rohm Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and engineering.

Collaborations

Kido has collaborated with notable colleagues, including Yoshitake Natsume and Tadashi Ogasawara. These partnerships have contributed to the advancement of sputtering technology and its applications in various industries.

Conclusion

Jyunji Kido's innovative work in sputtering technology has led to significant advancements in the production of thin films. His contributions continue to impact the field, showcasing the importance of innovation in materials science.