The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
Jul. 03, 2006
Jyunji Kido, Yonezawa, JP;
Yoshitake Natsume, Amagasaki, JP;
Tadashi Ogasawara, Amagasaki, JP;
Kazuomi Azuma, Amagasaki, JP;
Koichi Mori, Fujisawa, JP;
Jyunji Kido, Yonezawa, JP;
Yoshitake Natsume, Amagasaki, JP;
Tadashi Ogasawara, Amagasaki, JP;
Kazuomi Azuma, Amagasaki, JP;
Koichi Mori, Fujisawa, JP;
OSAKA Titanium technologies Co., Ltd., Amagasaki-shi, JP;
ROHM Co., Ltd., Kyoto, JP;
Abstract
Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiOpowder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of SiαTiβOγ wherein α, β and γ are mole ratios of Si, Ti and O, respectively, and the ratio of α/β ranges from 0.45 to 7.25 and the ratio of γ/(α+β) ranges from 0.80 to 1.70.