Jyunji Ariga

Title: Jyunji Ariga: Innovator in Substrate Processing Technology

Introduction

Jyunji Ariga is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique cleaning method for substrate processing apparatuses.

Latest Patents

Jyunji Ariga holds 1 patent for his invention titled "Cleaning method of substrate processing apparatus and substrate processing apparatus." This patent describes a method for cleaning the inside of an exhaust pipe that is used to expel gas from a processing container. The method involves two key steps: first, removing deposits on the downstream side of an opening/closing valve by supplying a cleaning gas containing fluorine while the valve is closed. Second, it involves removing deposits on the upstream side of the valve by supplying a second cleaning gas that does not contain fluorine while the valve is opened.

Career Highlights

Jyunji Ariga is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on enhancing the efficiency and effectiveness of substrate processing technologies. His innovative methods have the potential to improve the overall performance of processing apparatuses.

Collaborations

Throughout his career, Jyunji has collaborated with talented individuals such as Yoshihiro Takezawa and Daisuke Suzuki. These collaborations have fostered a creative environment that encourages innovation and the development of advanced technologies.

Conclusion

Jyunji Ariga's contributions to substrate processing technology exemplify the spirit of innovation. His patented cleaning method showcases his commitment to improving industrial processes. His work at Tokyo Electron Limited continues to influence the field positively.