Jyh Shorng Horng

Title: Inventor Jyh Shorng Horng: Innovating Substrate Handling in Etching Processes

Introduction

Jyh Shorng Horng, an accomplished inventor based in Taipei, Taiwan, has made a significant contribution to the field of semiconductor processing. His innovative work aims to improve the efficiency and effectiveness of etching processes by enhancing the methods used for handling substrates.

Latest Patents

Jyh Shorng Horng holds a patent for an "Apparatus for carrying substrates processed in an etching process." This invention is designed to carry substrates while providing a guiding member that shelters and protects them from being dampened by droplets, ultimately keeping the substrates dry and clean. The apparatus features spaced chucks connected to a substrate holder with two arms. A key component is the roof plate, which is located under the chucks and abutted against the arms, effectively directing any droplets away from the substrates.

Career Highlights

Currently, Jyh Shorng Horng is employed at Nan Ya Technology Corporation, a prominent company in the semiconductor industry. His involvement in this innovative work highlights his commitment to advancing technology and ensuring high-quality outcomes in manufacturing processes.

Collaborations

During his career, Jyh has collaborated with notable colleagues such as Wen Chi Hsu and Yinan Chen. These partnerships exemplify the collaborative spirit of innovation in the tech industry, enabling the exchange of ideas and furthering advancements in substrate processing technology.

Conclusion

Jyh Shorng Horng's inventive contributions serve as a testament to the vital role that innovation plays in the semiconductor field. His patent reflects a proactive approach to addressing challenges in etching processes, marking him as a valuable asset in his field and a significant contributor within the realm of substrate handling technology.