The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2000

Filed:

Jul. 29, 1999
Applicant:
Inventors:

Wen Chi Hsu, Hualien Hsien, TW;

Yinan Chen, Taipei, TW;

Shang-Shu Chung, Taipei, TW;

Jung-Hsing Chien, Taoyuan, TW;

Jyh Shorng Horng, Taipei, TW;

Chien-Hua Lee, Taipei Hsien, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ; B08B / ; B65G / ;
U.S. Cl.
CPC ...
156345 ; 134 82 ; 414935 ;
Abstract

The apparatus of the present invention is used to carry substrates processed in an etching process and provides a guiding member to shelter and protect substrates from being dampened by droplets. The apparatus comprises spaced chucks connected to a substrate holder with two arms, respectively. The guiding member is a roof plate disposed under the chucks and abutted against the arms, so that the guiding member can induce the droplets falling from the chucks to flow to the arms. The substrates can be effectively kept dry and clean.


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