Winterswijk, Netherlands

Jw Berenschot

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nanopass Technologies Ltd.. Active years: 2010.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Jw Berenschot: Innovator in Microneedle Technology

Introduction

Jw Berenschot is a notable inventor based in Winterswijk, Netherlands. He has made significant contributions to the field of microneedle technology, which has applications in various medical and cosmetic fields. His innovative approach to creating microneedles has the potential to revolutionize drug delivery systems.

Latest Patents

Jw Berenschot holds a patent for a microneedle structure and production method. This patent describes a method for processing a wafer to form a plurality of hollow microneedles projecting from a substrate. The process involves forming recessed features using a dry etching process, which includes slots and holes. The internal surfaces of these features are coated with a protective layer, followed by an anisotropic wet etching process that removes material from outside the included areas while preserving the projecting features. Finally, the protective layer is removed to reveal the microneedles.

Career Highlights

Jw Berenschot is associated with Nanopass Technologies Ltd., where he continues to develop and refine his innovative technologies. His work has garnered attention for its potential to improve the efficacy and comfort of medical treatments.

Collaborations

He has collaborated with notable colleagues such as Yehoshua Yeshurun and Meir Hefetz, contributing to advancements in microneedle technology.

Conclusion

Jw Berenschot's contributions to microneedle technology exemplify the innovative spirit of modern inventors. His work not only enhances medical applications but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
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