Wiesbaden, Germany

Jutta Bachstein

This inventor holds 2 USPTO granted patents. Top assignee: Agfa-Gevaert Ag. Active years: 1997-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jutta Bachstein. Retrieved from https://idiyas.com/inventor/jutta-bachstein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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2 patents (USPTO):Explore Patents

Title: Jutta Bachstein: Innovator in Radiation-Sensitive Recording Materials

Introduction

Jutta Bachstein is a notable inventor based in Wiesbaden, Germany. She has made significant contributions to the field of radiation-sensitive recording materials. With a total of 2 patents, her work has advanced the technology used in various applications.

Latest Patents

Jutta's latest patents focus on the development of irradiated radiation-sensitive recording materials. One of her patents describes a process for developing these materials using an aqueous-alkaline developer that contains specific compounds. This innovative approach enhances the efficiency and effectiveness of the development process.

Career Highlights

Throughout her career, Jutta has worked with Agfa-Gevaert AG, a company renowned for its imaging and printing solutions. Her expertise in the field has allowed her to contribute to the advancement of technology in recording materials.

Collaborations

Jutta has collaborated with esteemed colleagues such as Andreas Elsaesser and Werner Frass. These partnerships have fostered innovation and have been instrumental in her research and development efforts.

Conclusion

Jutta Bachstein's contributions to the field of radiation-sensitive recording materials highlight her role as a leading inventor. Her patents and collaborations reflect her commitment to advancing technology in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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