Cherepovets, Russia

Jury V Lipukhim

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jury V Lipukhim. Retrieved from https://idiyas.com/inventor/jury-v-lipukhim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Jury V Lipukhim: Innovator in Metal Processing

Introduction

Jury V Lipukhim is a notable inventor based in Cherepovets, Russia. He has made significant contributions to the field of metal processing, particularly with his innovative methods for improving manufacturing processes. His work has garnered attention for its practical applications in industry.

Latest Patents

Jury V Lipukhim holds a patent for a "Method for removing scale from a metal strip." This invention addresses a common issue in metal processing, enhancing the quality and efficiency of metal strips used in various applications. He has 1 patent to his name, showcasing his inventive capabilities.

Career Highlights

Throughout his career, Lipukhim has focused on developing solutions that improve manufacturing processes. His dedication to innovation has positioned him as a valuable contributor to the industry. His work reflects a commitment to advancing technology in metal processing.

Collaborations

Jury V Lipukhim has collaborated with notable colleagues, including Leonid I Danilov and Anatoly N Subbotin. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Jury V Lipukhim's contributions to the field of metal processing through his innovative patent demonstrate his expertise and commitment to advancing manufacturing techniques. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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