This inventor holds 1 USPTO granted patent. Top assignee: Veesojuzny Ordena Trudovogo Krasnogo Znameni Naucho-Issle. Active years: 1986.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1986
Title: Jury K Tolsky: Innovator in Down-Hole Machinery
Introduction
Jury K Tolsky is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of down-hole machinery, particularly with his innovative designs that enhance operational efficiency.
Latest Patents
Tolsky holds a patent for a "Multistage Helical Down-Hole Machine with Frictional Coupling of Working." This invention features a helical down-hole machine that consists of multiple sections, each equipped with a helical rotor and a helical stator. These components are arranged with a preselected eccentricity to create cavities of variable volume for fluid passage. The sections are positioned axially in series, and the identical elements of these sections are rigidly interconnected. Notably, the rigid connection of at least one of these identical elements can be detached through a frictional joint, allowing for secure operation during rotation.
Career Highlights
Tolsky's career is marked by his dedication to advancing down-hole technology. His innovative approach has led to the development of machinery that improves the efficiency and effectiveness of drilling operations. His work is recognized within the industry for its practical applications and technical ingenuity.
Collaborations
Throughout his career, Tolsky has collaborated with esteemed colleagues, including Dmitry F Baldenko and Jury V Vadetsky. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Jury K Tolsky's contributions to the field of down-hole machinery exemplify his commitment to innovation and engineering excellence. His patented designs continue to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile