This inventor holds 1 USPTO granted patent. Top assignees: Dong-A University Research Foundation for Industry-Academy Cooperation, G. M. Corporation, Ltd., Mirae Environmental Plan. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Jurng Jae Yee: Innovator in Double-Skin Structures
Introduction
Jurng Jae Yee is a notable inventor based in Busan, South Korea. He has made significant contributions to the field of architectural design, particularly with his innovative patent related to double-skin structures. His work reflects a commitment to enhancing building efficiency and aesthetics.
Latest Patents
Jurng Jae Yee holds a patent for a double-skin structure. This invention features a slim design that includes a window frame, an outer window sash frame, an outer glass, an inner window sash frame, an inner glass, an awning film, and a case-type glass fixing frame. The awning film serves as a shading element, positioned within a hollow layer formed between the outer and inner glasses. This innovative design not only improves energy efficiency but also enhances the overall functionality of windows in buildings.
Career Highlights
Throughout his career, Jurng Jae Yee has worked with esteemed organizations such as the Dong-a University Research Foundation for Industry-Academy Cooperation and G. M. Corporation, Ltd. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in architectural technology.
Collaborations
Jurng Jae Yee has collaborated with notable colleagues, including Keon Ho Lee and Seong Hoon Kee. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking inventions.
Conclusion
Jurng Jae Yee's contributions to the field of double-skin structures exemplify his innovative spirit and dedication to improving architectural design. His patent and collaborative efforts highlight the importance of creativity and teamwork in driving advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile