Saint-Petersburg, Russia

Juri Pavlovietc Dikov

This inventor holds 1 USPTO granted patent. Top assignee: Alfar International, Inc.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Juri Pavlovietc Dikov. Retrieved from https://idiyas.com/inventor/juri-pavlovietc-dikov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Juri Pavlovietc Dikov: Innovator in Nanotechnology

Introduction

Juri Pavlovietc Dikov is a notable inventor based in St. Petersburg, Russia. He has made significant contributions to the field of nanotechnology, particularly through his innovative methods of producing composite materials. His work has garnered attention for its potential applications in various industries.

Latest Patents

Dikov holds a patent for a method of producing a composite, specifically a nanoporous body. This invention showcases his expertise in material science and his commitment to advancing technology in this area. The patent reflects his innovative approach to creating materials with unique properties.

Career Highlights

Dikov is currently associated with Alfar International, Inc., where he continues to develop and refine his inventions. His career is marked by a dedication to research and development, focusing on the practical applications of his work in nanotechnology. His contributions have positioned him as a key figure in his field.

Collaborations

Dikov has worked alongside notable colleagues, including Andrej Nicolajvietc Smolianinov and Sergey Konstantinovitch Gordeev. These collaborations have enriched his research and expanded the scope of his innovations.

Conclusion

Juri Pavlovietc Dikov is a prominent inventor whose work in nanotechnology is paving the way for future advancements. His patent and ongoing research reflect his commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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