Clinton, CT, United States of America

Jurgen M Kruse

This inventor holds 10 USPTO granted patents. Top assignees: Xaar Plc, Am International Incorporated, Other. Active years: 1989-1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jurgen M Kruse. Retrieved from https://idiyas.com/inventor/jurgen-m-kruse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.4

ph-index = 9

Forward Citations = 222(Granted Patents)


Location History:

  • Branford, CT (US) (1989 - 1992)
  • Clinton, CT (US) (1990 - 1993)
  • Tucson, AZ (US) (1995 - 1997)

Company Filing History:


Years Active: 1989-1997

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10 patents (USPTO):Explore Patents

Title: Jurgen M Kruse: Innovator in Ink Composition

Introduction

Jurgen M Kruse is a notable inventor based in Clinton, CT (US), recognized for his contributions to the field of ink composition. With a total of 10 patents to his name, he has made significant advancements that have impacted various industries.

Latest Patents

Among his latest innovations, Jurgen has developed an ink composition that features reduced nozzle viscous impedance. This invention is crucial for improving the efficiency and performance of inkjet printing technologies.

Career Highlights

Throughout his career, Jurgen has worked with Xaar Plc, a company known for its cutting-edge inkjet technology. His work at Xaar has allowed him to refine his expertise in ink formulations and printing processes.

Collaborations

Jurgen has collaborated with several talented individuals, including John T Price and Donald B Kimball, Jr. These partnerships have fostered a creative environment that has led to innovative solutions in the field of ink technology.

Conclusion

Jurgen M Kruse's contributions to ink composition and his collaborative efforts with industry professionals highlight his role as a significant innovator. His work continues to influence advancements in printing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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