Puchheim, Germany

Jurgen Geyer

This inventor holds 1 USPTO granted patent. Top assignee: Siemens Aktiengesellschaft. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jurgen Geyer. Retrieved from https://idiyas.com/inventor/jurgen-geyer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Jurgen Geyer: Innovator in Optoelectronic Scanning Technology

Introduction

Jurgen Geyer is a notable inventor based in Puchheim, Germany. He has made significant contributions to the field of optoelectronics, particularly through his innovative patent related to scanning arrangements.

Latest Patents

Jurgen Geyer holds a patent for an optoelectronic scanning arrangement that involves optical reflective markings. This invention focuses on scanning optical markings that consist of a reflecting mark and a non-reflecting mark, which is inclined at a specific angle from the axis of the rays emitted by a light source. His patent is a testament to his expertise and creativity in the field.

Career Highlights

Geyer is associated with Siemens Aktiengesellschaft, a leading global technology company. His work at Siemens has allowed him to engage in cutting-edge research and development, contributing to advancements in optoelectronic technologies.

Collaborations

Throughout his career, Jurgen Geyer has collaborated with various professionals, including his coworker Ernst Kegler. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Jurgen Geyer is a distinguished inventor whose work in optoelectronic scanning arrangements has made a significant impact in the field. His contributions continue to influence advancements in technology and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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