Beijing, China

Junyu Li

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.. Active years: 2018.


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Junyu Li - Innovator in Mask Technology

Introduction

Junyu Li is a prominent inventor based in Beijing, China. He has made significant contributions to the field of mask technology, particularly in methods that enhance manufacturing processes. His innovative approach has led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

Junyu Li holds a patent titled "Method for eliminating mask self-magnetization, substrate manufacturing method and mask testing device." This patent discloses a method for eliminating self-magnetization of a mask, a method for manufacturing a substrate, and a mask testing device. The invention includes a mask that features a plurality of metal stripes spaced from each other. The method involves energizing the mask, allowing the metal stripes to carry like charges, which effectively separates each stripe from adjacent ones that are bonded together. This innovative solution enhances the efficiency and effectiveness of mask manufacturing.

Career Highlights

Throughout his career, Junyu Li has worked with notable companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Ordos Yuansheng Optoelectronics Co., Ltd. His experience in these organizations has contributed to his expertise in the field and has allowed him to develop groundbreaking technologies.

Collaborations

Junyu Li has collaborated with several talented individuals in his field. Notable coworkers include Yan Wu and Yuedong Shang, who have contributed to various projects alongside him. Their combined efforts have fostered innovation and advancement in mask technology.

Conclusion

Junyu Li is a distinguished inventor whose work in mask technology has led to significant advancements in the industry. His patent for eliminating mask self-magnetization showcases his innovative thinking and dedication to improving manufacturing processes. His contributions continue to influence the field and inspire future innovations.

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