Tsukubamirai, Japan

Junya Okada

This inventor holds 2 USPTO granted patents. Top assignee: Smc Corporation. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junya Okada. Retrieved from https://idiyas.com/inventor/junya-okada-gyy6jg5x

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2016-2026

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2 patents (USPTO):Explore Patents

Title: Junya Okada: Innovator in Flow Sensor Technology

Introduction

Junya Okada is a prominent inventor based in Tsukubamirai, Japan. He is known for his contributions to the field of sensor technology, particularly in the development of flow sensors. With a focus on innovation, Okada has made significant strides in enhancing the functionality and efficiency of these devices.

Latest Patents

Junya Okada holds 1 patent for his innovative flow sensor. This invention showcases his expertise in creating advanced solutions that meet the demands of modern technology. The flow sensor is designed to provide accurate measurements, which are crucial in various industrial applications.

Career Highlights

Okada is currently employed at SMC Corporation, a leading company in the field of automation and control systems. His role at SMC Corporation allows him to work on cutting-edge projects that push the boundaries of sensor technology. His dedication to research and development has positioned him as a key player in his field.

Collaborations

Junya Okada collaborates with his coworker, Yuta Oshima, to further enhance their projects and innovations. Their teamwork exemplifies the importance of collaboration in driving technological advancements.

Conclusion

Junya Okada's contributions to flow sensor technology reflect his commitment to innovation and excellence. His work at SMC Corporation and his patent demonstrate his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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