Hiratsuka, Japan

Junya Hayakawa

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Engineering-Plastics Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junya Hayakawa. Retrieved from https://idiyas.com/inventor/junya-hayakawa-20r4cmf3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Junya Hayakawa: Innovator in Polycarbonate Resin Technology

Introduction

Junya Hayakawa is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of materials science, particularly in the development of polycarbonate resin compositions. His innovative work has led to advancements that benefit various industries.

Latest Patents

Hayakawa holds a patent for a polycarbonate resin composition pellet, which includes a polycarbonate resin, an aromatic compound, and a phosphorus-based stabilizer. This composition is designed to enhance the properties of the resin, making it more effective for various applications. The patent details the specific amounts of each component, ensuring optimal performance and stability in the final product.

Career Highlights

Junya Hayakawa is currently employed at Mitsubishi Engineering-Plastics Corporation, where he continues to develop innovative materials. His work at the company has positioned him as a key player in the advancement of engineering plastics, contributing to the company's reputation for quality and innovation.

Conclusion

Junya Hayakawa's contributions to polycarbonate resin technology exemplify the impact of innovative thinking in materials science. His patent and ongoing work at Mitsubishi Engineering-Plastics Corporation highlight his role as a significant inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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