Suwon-si, South Korea

Junwhon Uhm

This inventor holds 3 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junwhon Uhm. Retrieved from https://idiyas.com/inventor/junwhon-uhm-6rgudy7s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0


Average Co-Inventor Count = 6.3

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations by Junwhon Uhm in Wearable Technology.

Introduction

Junwhon Uhm is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of wearable technology, particularly with his innovative designs that enhance user experience.

Latest Patents

One of Junwhon Uhm's key patents is a wearable electronic device for adjusting the distance between lenses. This device includes an adjustment structure that allows users to modify the distance between a first lens and a second lens. The design ensures that users can wear the device comfortably while aligning it with their eye positions. The adjustment mechanism features a lever and multiple gears that facilitate precise adjustments to the inter-lens distance.

Career Highlights

Junwhon Uhm is currently employed at Samsung Electronics Ltd., a leading company in technology and innovation. His work at Samsung has allowed him to explore and develop cutting-edge wearable devices that cater to consumer needs.

Collaborations

He has collaborated with talented coworkers such as Hyunmo Yang and Gyeongbeom Kim, contributing to the advancement of technology in their projects.

Conclusion

Junwhon Uhm's innovative work in wearable technology exemplifies the potential of inventions to improve user experience. His contributions continue to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…