This inventor holds 1 USPTO granted patent and 2 published patent applications. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Years Active: 2026
Title: Innovations of Junwen Long in Arc Protection Garments.
Introduction
Junwen Long is an innovative inventor based in Guiyang, China. She has made significant contributions to the field of safety apparel, particularly in the development of arc protection garments. Her work focuses on enhancing the safety and efficiency of protective clothing used in hazardous environments.
Latest Patents
Junwen Long holds a patent for an arc protection garment, which is designed to provide effective protection against electrical arcs. The garment comprises an arc protection garment body, a detachable fixed component that includes a fixed frame, a limit frame, an elastic member connection groove, and an opening. Additionally, it features a protective plate and a limit component consisting of a movable frame and a sliding rack. This innovative design allows for the quick removal of the protective plate without the need to turn over an injured person, facilitating emergency handling.
Career Highlights
Throughout her career, Junwen Long has focused on developing advanced protective gear that meets the needs of various industries. Her dedication to safety and innovation has positioned her as a notable figure in the field of protective clothing.
Collaborations
Junwen Long has collaborated with talented individuals such as Jialong Wu and Xi Fang, who have contributed to her research and development efforts. Their teamwork has played a crucial role in the advancement of her inventions.
Conclusion
Junwen Long's contributions to the field of arc protection garments demonstrate her commitment to safety and innovation. Her patented designs are set to make a significant impact in protecting individuals working in hazardous environments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile