Company Filing History:
Years Active: 2025
Title: Junsik Yu: Innovator in Photoresist Technology
Introduction
Junsik Yu is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of photoresist technology, particularly in methods that enhance the efficiency of pattern formation on substrates.
Latest Patents
Junsik Yu holds a patent for a "Method for forming photoresist pattern and method for forming pattern on a substrate." This innovative method involves the formation of a silicon oxide layer on a substrate, followed by the creation of a first photoresist pattern that contacts this layer. The process includes entire-surface exposure of the substrate, which allows for the removal of the first photoresist pattern that may have defects. Subsequently, a second photoresist pattern is formed on the silicon oxide layer, showcasing the advanced techniques Yu has developed in this area. He has 1 patent to his name.
Career Highlights
Junsik Yu is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has positioned him at the forefront of innovation in semiconductor manufacturing and photoresist applications.
Collaborations
Throughout his career, Junsik Yu has collaborated with talented individuals such as Gyeyoung Kim and Woojin Jung. These collaborations have further enriched his work and contributed to advancements in the field.
Conclusion
Junsik Yu's contributions to photoresist technology exemplify the innovative spirit of modern inventors. His patent and work at Samsung Electronics Co., Ltd. highlight his role in advancing semiconductor manufacturing techniques.