Shanghai, China

Junquan Huang

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junquan Huang. Retrieved from https://idiyas.com/inventor/junquan-huang-se1irfv5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2014

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Junquan Huang: Innovator in Photoconductor Technology

Introduction

Junquan Huang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of photoconductor technology. His work has led to the development of innovative solutions that enhance the efficiency and functionality of various devices.

Latest Patents

Junquan Huang holds a patent for a photoconductor cartridge. This invention showcases his expertise and commitment to advancing technology in his field. The patent reflects his innovative approach to solving complex problems in photoconductors.

Career Highlights

Huang is currently employed at Ricoh Company, Ltd., where he continues to push the boundaries of technology. His role at Ricoh allows him to collaborate with other talented professionals and contribute to groundbreaking projects. His dedication to innovation has earned him recognition within the industry.

Collaborations

Throughout his career, Junquan Huang has worked alongside esteemed colleagues such as Takuya Etoh and Hongjie Tan. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Junquan Huang is a prominent figure in the realm of photoconductor technology. His patent and work at Ricoh Company, Ltd. highlight his innovative spirit and dedication to advancing the field. His contributions are paving the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…