Company Filing History:
Years Active: 1993-1995
Title: Junko Hatta: Innovator in Charged Particle Beam Technology
Introduction
Junko Hatta is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of charged particle beam technology, holding 2 patents that showcase her innovative approach to pattern exposure methods.
Latest Patents
Hatta's latest patents include a "Charged Particle Beam Exposure System and Method of Exposing a Pattern" and a "Method for Writing a Pattern on an Object by a Focused Electron Beam." The first patent details a sophisticated method for exposing patterns on substrates using charged particle beams, involving multiple mask deflectors to ensure precision in alignment with the optical axis. The second patent focuses on minimizing distortion during the writing of patterns on surfaces by optimizing the movement of the object in relation to the exposure intervals.
Career Highlights
Junko Hatta is currently employed at Fujitsu Corporation, where she continues to develop cutting-edge technologies in her field. Her work has been instrumental in advancing the capabilities of charged particle beam systems, contributing to various applications in electronics and materials science.
Collaborations
Hatta has collaborated with notable colleagues, including Yoshihisa Oae and Kiichi Sakamoto, further enhancing the innovative environment at Fujitsu Corporation.
Conclusion
Junko Hatta's contributions to charged particle beam technology exemplify her dedication to innovation and excellence in her field. Her patents reflect a deep understanding of complex systems and a commitment to advancing technology.