Chiba, Japan

Junji Nanbu

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Ink and Chemicals, Incorporated. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junji Nanbu. Retrieved from https://idiyas.com/inventor/junji-nanbu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Junji Nanbu: Innovator in Photocurable Resin Compositions

Introduction

Junji Nanbu is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of photocurable resin compositions. His innovative work has led to the development of a unique patent that showcases his expertise in this area.

Latest Patents

Junji Nanbu holds a patent for a photocurable resin composition. This composition comprises an unsaturated polyester resin obtained by reacting an epoxy compound with an unsaturated monobasic acid. The formulation also includes a polymerizable vinyl monomer and a photopolymerization initiator that promotes radical polymerization through light irradiation. This invention is a testament to his creativity and technical knowledge.

Career Highlights

Nanbu is associated with Dainippon Ink and Chemicals, Incorporated, where he has been able to apply his skills and knowledge in the development of advanced materials. His work has not only contributed to the company but has also advanced the field of photocurable resins.

Collaborations

Throughout his career, Junji Nanbu has collaborated with esteemed colleagues such as Nagao Ariga and Hiroshi Oikawa. These partnerships have fostered innovation and have been instrumental in the success of various projects.

Conclusion

Junji Nanbu's contributions to photocurable resin compositions highlight his role as a significant inventor in the field. His patent and collaborations reflect his dedication to innovation and advancement in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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