Tokyo, Japan

Junichi Sayama

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hitachi High-Tech Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichi Sayama. Retrieved from https://idiyas.com/inventor/junichi-sayama-jh4ducly

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Junichi Sayama: Innovator in Plasma Processing Technology

Introduction

Junichi Sayama is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of plasma processing technology. His innovative work has led to advancements that enhance the accuracy and uniformity of plasma processing.

Latest Patents

Junichi Sayama holds a patent for a plasma processing apparatus. This invention allows for independent control of plasma density distribution, enabling more precise processing of samples. The apparatus includes a vacuum vessel, a radio frequency power source, a sample stage, and a magnetic field forming unit. This design aims to improve processing uniformity by utilizing a unique configuration of coils and yokes.

Career Highlights

Sayama is associated with Hitachi High-Tech Corporation, where he has made significant contributions to research and development in plasma technology. His work has been instrumental in advancing the capabilities of plasma processing equipment.

Collaborations

Throughout his career, Junichi Sayama has collaborated with notable colleagues, including Taku Iwase and Masakazu Isozaki. These collaborations have fostered innovation and have contributed to the success of various projects within the company.

Conclusion

Junichi Sayama's work in plasma processing technology exemplifies the impact of innovative thinking in engineering. His patent and contributions to Hitachi High-Tech Corporation highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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