Chiba, Japan

Junichi Kawanobe

This inventor holds 1 USPTO granted patent. Top assignee: Murakami Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichi Kawanobe. Retrieved from https://idiyas.com/inventor/junichi-kawanobe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Junichi Kawanobe: Innovator in Photosensitive Resin Technology

Introduction

Junichi Kawanobe is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of photosensitive materials, particularly through his innovative patent related to photosensitive resin compositions.

Latest Patents

Kawanobe holds a patent for a "Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition." This invention is characterized by a unique photosensitive composition that includes components A, B, and C. Component A is a poly(vinyl alcohol) polymer with specific structural characteristics. Component B is a radical polymerizable monomer with at least one ethylenically unsaturated bond, while Component C is a radical photoinitiator. This combination allows for advanced applications in screen printing.

Career Highlights

Kawanobe is currently associated with Murakami Co., Ltd., where he continues to develop and refine his innovative ideas. His work has led to advancements in the use of photosensitive materials in various applications.

Collaborations

He has collaborated with notable coworkers, including Kunihiro Ichimura and Chieko Hotta, contributing to the development of new technologies and enhancing the capabilities of their projects.

Conclusion

Junichi Kawanobe's contributions to the field of photosensitive materials exemplify the spirit of innovation. His patent and ongoing work at Murakami Co., Ltd. highlight his commitment to advancing technology in screen printing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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