Location History:
- Yokohama, JP (2006 - 2014)
- Chiyoda-ku, JP (2012 - 2018)
Company Filing History:
8 out of 2,560 
2 out of 97 
Years Active: 2006-2018
Title: Junichi Kageyama: Innovator in Reflective Mask Technology
Introduction
Junichi Kageyama is a prominent inventor based in Chiyoda-ku, Japan. He has made significant contributions to the field of reflective mask technology, holding a total of 8 patents. His work focuses on advancements in EUV lithography and reflective mask blanks, which are crucial for modern semiconductor manufacturing.
Latest Patents
Kageyama's latest patents include a reflective mask blank and a process for producing this reflective mask blank. This innovative reflective mask blank consists of a substrate, a reflective multilayer film designed to reflect exposure light, and an absorber layer that absorbs the exposure light. The reflective multilayer film features at least three fiducial marks formed in a concave shape outside the exposure area, each with a specific inclination angle. Additionally, he has developed a process for inspecting EUV mask blanks that can distinguish between phase defects and amplitude defects, enhancing the quality control in semiconductor production.
Career Highlights
Throughout his career, Kageyama has worked with notable companies such as Asahi Glass Company, Limited and Sematech, Inc. His expertise in reflective mask technology has positioned him as a key player in the semiconductor industry, contributing to the advancement of lithography techniques.
Collaborations
Kageyama has collaborated with esteemed colleagues, including Kazuyuki Hayashi and Vibhu Jindal. These partnerships have fostered innovation and development in the field of reflective mask technology.
Conclusion
Junichi Kageyama's contributions to reflective mask technology and EUV lithography have made a significant impact on the semiconductor industry. His innovative patents and collaborations continue to drive advancements in this critical field.