This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2013.
Location History:
- Hitachi, JP (2013)
- Ibaraki, JP (2013)
Company Filing History:
Years Active: 2013
Title: Junichi Iso: Innovator in Photosensitive Technology
Introduction
Junichi Iso is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive technology, holding a total of 3 patents. His work primarily focuses on the development of photosensitive elements and related methods.
Latest Patents
Iso's latest patents include innovative technologies such as a photosensitive element, a method for the formation of a resist pattern, and a method for the production of printed circuit boards. The photosensitive element he developed comprises a support, a photosensitive layer, and a protective film laminated in that order. The photosensitive layer is composed of a photosensitive resin composition that contains a binder polymer, a photopolymerizing compound, a photopolymerization initiator, and a compound with a maximum absorption wavelength of 370-420 nm. The protective film is primarily made of polypropylene. Additionally, his photosensitive resin composition includes a binder polymer, a photopolymerizing compound with an ethylenic unsaturated bond, a photopolymerization initiator, and a polymerization inhibitor, with the inhibitor's content ranging from 20-100 ppm by mass based on the total solid content of the composition.
Career Highlights
Junichi Iso is currently employed at Hitachi Chemical Company, Ltd., where he continues to innovate in the field of photosensitive materials. His work has been instrumental in advancing technologies that are crucial for modern electronics.
Collaborations
Iso has collaborated with notable colleagues such as Yoshiki Ajioka and Mitsuru Ishi, contributing to various projects that enhance the capabilities of photosensitive technologies.
Conclusion
Junichi Iso's contributions to the field of photosensitive technology are significant and impactful. His innovative patents and ongoing work at Hitachi Chemical Company, Ltd. continue to shape the future of electronic materials.