Daejeon, South Korea

Jungwoo Park

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Real Identity Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jungwoo Park. Retrieved from https://idiyas.com/inventor/jungwoo-park-jpsmtysh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Jungwoo Park - Innovator in Biometric Authentication

Introduction

Jungwoo Park is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of biometric authentication technology. His innovative approach aims to enhance personal security through advanced authentication methods.

Latest Patents

Jungwoo Park holds a patent for a "Biometric authentication apparatus and method." This invention relates to a biometric authentication apparatus that utilizes a unique method of applying a square wave to electrodes for reliable personal authentication. The technology measures voltage differences to ensure high reliability in detecting human presence for authentication purposes.

Career Highlights

Jungwoo Park is associated with Real Identity Co., Ltd., where he continues to develop cutting-edge technologies in biometric systems. His work focuses on improving the accuracy and reliability of biometric authentication methods.

Collaborations

He collaborates with talented colleagues, including Ki-Hun Jeong and Sung Hoon Jung, to advance the field of biometric technology. Their combined expertise contributes to innovative solutions in personal authentication.

Conclusion

Jungwoo Park's contributions to biometric authentication represent a significant advancement in personal security technology. His innovative methods and collaborative efforts continue to shape the future of authentication systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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