This inventor holds 1 USPTO granted patent. Top assignee: Kimberly-Clark Worldwide, Inc.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Junghyun Park: Innovator in Absorbent Article Technology
Introduction
Junghyun Park is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of absorbent articles, particularly through his innovative designs that enhance user adaptability and comfort. His work is recognized for addressing the specific needs of individual wearers.
Latest Patents
Junghyun Park holds a patent for an "Absorbent article with multi-use protection layer." This invention is designed to be more readily adaptable to meet the needs of the individual wearer. The absorbent article features a topsheet layer, a backsheet layer, and an absorbent core situated between these layers. The backsheet layer includes a garment attachment mechanism on its garment-facing surface. Additionally, the protection layer is engaged with the garment attachment mechanism and can be partially disengaged, allowing the wearer to utilize it for additional coverage as needed.
Career Highlights
Junghyun Park is currently employed at Kimberly-Clark Worldwide, Inc., a leading company in personal care products. His role involves developing innovative solutions that improve the functionality and comfort of absorbent products. His patent reflects his commitment to enhancing user experience through thoughtful design.
Collaborations
Junghyun has collaborated with talented coworkers such as KyuLe Lee and Franz Aschenbrenner. Their combined expertise contributes to the advancement of absorbent article technology.
Conclusion
Junghyun Park's innovative work in absorbent article technology showcases his dedication to improving user adaptability and comfort. His patent highlights the importance of personalized solutions in product design.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile