Yongin, South Korea

Junghoon Shin

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junghoon Shin. Retrieved from https://idiyas.com/inventor/junghoon-shin-migu61oj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Junghoon Shin and Display Device Innovation.

Introduction

Junghoon Shin is an inventor based in Yongin, South Korea. His patent work includes a display-device design focused on reducing thickness while improving scratch resistance.

Latest Patents

Shin is associated with one patent, 1 patent, titled “Display device.” The invention describes a display panel with a coating layer beneath it and a protective layer beneath the coating. The coating layer includes an organic-material base with a viscosity of about 1,000 cps or greater, along with dispersed fillers. The protective layer contains a metal, metal oxide, or conductive polymer, and its bottom surface has a pencil hardness of at least H. The design aims to make the display device thinner and more resistant to scratches.

Career Highlights

Shin is associated with Samsung Display Co., Ltd., a company whose work includes display technologies. His patent reflects an engineering approach to balancing a slim device profile with surface durability.

Collaborations

Shin’s listed coworker is Donghwan Kim. Their association with the display-device patent highlights collaborative work in display technology.

Conclusion

Junghoon Shin’s patent describes a display structure designed to combine reduced thickness with improved scratch resistance, illustrating his contribution to display-device innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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