This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Jungha Hwang: Innovator in Semiconductor Technology
Introduction
Jungha Hwang is a prominent inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and manufacturing methods.
Latest Patents
Hwang holds a patent for a semiconductor device that includes a conductive structure and an insulating structure. The patent describes a semiconductor device that features a barrier layer, an anti-migration layer, a liner, a conductive layer, and a capping layer. The capping layer and the liner are composed of cobalt (Co), while the anti-migration layer contains manganese (Mn). This invention aims to enhance the performance and reliability of semiconductor devices.
Career Highlights
Jungha Hwang is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to the development of advanced electronic devices.
Collaborations
Hwang has collaborated with notable colleagues, including Dongchan Lim and Seulgi Bae. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.
Conclusion
Jungha Hwang's contributions to semiconductor technology exemplify the innovative spirit of modern inventors. His patent and work at Samsung Electronics Ltd. highlight the importance of continuous research and development in the tech industry.