This inventor holds 1 USPTO granted patent. Top assignee: Himile Mechanical Science and Technology (Shandong) Co., Ltd.. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Jungang Xue: Innovator in Cleaning Technology
Introduction
Jungang Xue is a notable inventor based in Shandong, China. He has made significant contributions to the field of cleaning technology, particularly with his innovative methods and apparatuses designed for cleaning workpieces and tire segment molds. His work is characterized by a focus on efficiency and effectiveness in cleaning processes.
Latest Patents
Jungang Xue holds 1 patent for his invention titled "Method and apparatus for cleaning workpiece, and method and apparatus for cleaning (pore-free) tire segment mold." This patent describes a unique method that involves heating the workpiece to a preset temperature and applying a cleaning solution that vaporizes instantaneously. This process creates micro-explosions at each shocking point, effectively peeling dirt off the workpiece. The apparatus he developed not only cleans the surface but also addresses the challenges of cleaning micron or nano-scale gaps, making it a significant advancement in the field.
Career Highlights
Jungang Xue is associated with Himile Mechanical Science and Technology (Shandong) Co., Ltd., where he has been instrumental in developing innovative cleaning solutions. His work has been recognized for its lower cost and thorough dirt removal capabilities, which are essential in various industrial applications.
Collaborations
Jungang has collaborated with notable colleagues such as Ren Zhang and Haibo Ma. Their combined expertise has contributed to the advancement of cleaning technologies within their organization.
Conclusion
Jungang Xue's innovative approach to cleaning technology has positioned him as a key figure in the industry. His patented methods and apparatuses reflect a commitment to improving cleaning processes, making significant strides in efficiency and effectiveness.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile