Pyeongtaek, South Korea

Jung Yeol Shin

This inventor holds 1 USPTO granted patent. Top assignee: Lms, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung Yeol Shin. Retrieved from https://idiyas.com/inventor/jung-yeol-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Jung Yeol Shin in Optical Filtering Technology

Introduction

Jung Yeol Shin is a notable inventor based in Pyeongtaek, South Korea. He has made significant contributions to the field of optical technology, particularly with his innovative designs that enhance the performance of optical filters. His work is characterized by a focus on efficiency and cost-effectiveness, making it valuable in various applications.

Latest Patents

Jung Yeol Shin holds a patent for an optical filter that boasts a narrow bandpass and high transmittance within the bandpass. This invention also features low transmittance outside the bandpass, ensuring minimal changes in optical properties even when the angle of incident light varies. This design is advantageous in terms of yield and cost per hour. Furthermore, his patent may be integrated into a LiDAR system, showcasing its potential applications in advanced technologies.

Career Highlights

Jung Yeol Shin is associated with Lms, Inc., where he continues to develop and refine his innovative ideas. His work at the company reflects a commitment to advancing optical technologies and improving their practical applications in various industries.

Collaborations

He collaborates with talented coworkers, including Tae Jin Song and Seong Yong Yoon, who contribute to the development of cutting-edge technologies alongside him.

Conclusion

Jung Yeol Shin's contributions to optical filtering technology exemplify the importance of innovation in enhancing performance and efficiency. His work not only advances the field but also opens new avenues for applications in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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